The study is performed on full mm wafers coated with blanket Cu films to examine removal rates and uniformity and on partial wafers to investigate the CMP of Cu damascene structures. Email Password Password must be at least 8 characters. To serve you better, please fill out the following information. Search for related content. Articles by Currie, J.
|Date Added:||20 July 2010|
|File Size:||20.40 Mb|
|Operating Systems:||Windows NT/2000/XP/2003/2003/7/8/10 MacOS 10/X|
|Price:||Free* [*Free Regsitration Required]|
To serve you better, please fill out the following information. Services Email this article to a colleague Alert me when this article is cited Alert me if a correction is posted Article Usage Statistics Similar articles in this journal Similar articles in Web of Science Add to My File Cabinet Download to citation manager Purchase a print ces of this issue Permission requests. User Name Password Sign In. ECS Tuning is not affiliated fcs any automobile manufacturers.
Password must contain a lowercase letter, an uppercase letter, a digit and a special character! At least one option needs to be selected. Limited fcs year warranty. Your email address will only be used for the notification of this product and deleted afterward. Reduced to this price: Negrych bG.
There was an error submitting your request, please try again. All warranties, product application, fitment, and performance are the responsibility of ECS Tuning.
Your video will appear once it is approved. Related Content Load related web page information. Corrosion induced defects are prevented by the addition of a passivating agent. Exs steel housings with adjustable ride height collars.
Enter your email address below to be notified when this product is no longer on back order. Alert me to new issues of J. Please try again, or Reset Your Password.
YouTube Link Add Video. Rau b and J.
Development of a Slurry Employing a Unique Silica Abrasive for the CMP of Cu Damascene Structures
We describe the development and examine the performance of a slurry containing an organic acid salt, a silica abrasive obtained from the hydrolysis of ethyl silicate TEOSand a passivating agent for the dcs mechanical planarization CMP of Cu damascene structures. Google Scholar Articles by Wrschka, P. Password must be at least 8 characters. Hernandez aG.
Fedco Electronics, ENERGY+ batteries and accessories for laptop,notebook computers
Haag bP. Latest Articles All dampers found in this FK coilover system shall be replaced under warranty pending warranty approval from ECS Tuning.
Email Password Password must be at least 8 characters. Because of the effective removal of the liner material, long overpolishing times become unnecessary, thus, spacer erosion is avoided.
Enter your email address below and instructions to reset your password will be emailed to you. Abstract We describe the development and examine the performance of a slurry containing an organic acid salt, a silica abrasive obtained from the hydrolysis of ethyl silicate TEOSand a passivating agent for the chemical mechanical planarization CMP h321 Cu damascene structures.
Sorry, I don’t understand this YouTube link.